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Influence of laser microfabrication on silicon electrochemical behavior in HF solution

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Abstract

Influence of direct laser writing with femtosecond pulses on electrochemical etching of n-type low conductivity (>1,000 Ωcm) silicon is demonstrated. It has been shown that thermal 1-µm-thick SiO2 layer on silicon surface can be used as a protective layer in the electrochemical etching process. It has been found that laser ablation changes not only the surface morphology and structure of silicon samples but also the character of their anodic etching in aqueous solution of hydrofluoric acid. Formation of microvoids and caverns of irregular shape has been observed at the laser-ablated sites. It is proposed that the change of silicon conductivity from n- to p-type takes place at the laser fabricated regions. Processes of Si anodic oxidation and electrochemical etching are discussed.

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Acknowledgments

Financial support by a 20070305-1 grant from Lithuanian “Mokslininku¸ sa¸jungos institutas” is gratefully acknowledged. SJ is thankful for support via a Grant-in-Aid from the Ministry of Education, Science, Sports, and Culture of Japan no. 19360322.

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Authors and Affiliations

  1. Institute of Chemistry, A. Goštauto 9, Vilnius, 01108, Lithuania

    Kestutis Juodkazis, Jurga Juodkazytė & Putinas Kalinauskas

  2. Altechna Co. Ltd., Konstitucijos av. 23, Vilnius, 08105, Lithuania

    Titas Gertus

  3. Laser Research Center, Vilnius University, Saulėtekio 10, 10223, Vilnius, Lithuania

    Titas Gertus

  4. Institute of Materials Science and Applied Research, Saulėtekio 9, Vilnius, 2040, Lithuania

    Edgaras Jelmakas

  5. Research Institute for Electronic Science, Hokkaido University, N21W10 CRIS Bldg., Sapporo, 001-0021, Japan

    Hiroaki Misawa & Saulius Juodkazis

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  1. Kestutis Juodkazis
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  2. Jurga Juodkazytė
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  3. Putinas Kalinauskas
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  4. Titas Gertus
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  5. Edgaras Jelmakas
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  7. Saulius Juodkazis
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Correspondence to Kestutis Juodkazis.

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Juodkazis, K., Juodkazytė, J., Kalinauskas, P. et al. Influence of laser microfabrication on silicon electrochemical behavior in HF solution. J Solid State Electrochem 14, 797–802 (2010). https://doi.org/10.1007/s10008-009-0852-z

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  • DOI: https://doi.org/10.1007/s10008-009-0852-z

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