Skip to main content
Log in

Orientation studies of Si-phthalocyanine sulfonic acids cast on SiOx substrates

  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract.

Layers of dihydroxy silicon phthalocyanine tetrasulfonic acid and oligo-μ-oxo silicon phthalocyanine tetrasulfonic acid were prepared by solution-casting methods. The purity of the material was checked by X-ray photoemission spectroscopy. The orientation of the molecules in respect to the substrate plane was investigated by angle-dependent near-edge X-ray absorption fine-structure spectroscopy. The morphology was characterized by atomic force microscopy. Most samples exhibited a significant orientation that was accompanied by crystalline structures; others had no orientation at all with a dominant amorphous morphology. This behavior indicates that several preparation parameters affect the crystallinity and the orientation of the phthalocyanines.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

Author information

Authors and Affiliations

Authors

Additional information

Received: 16 January 2002 / Accepted: 11 February 2002 / Published online: 3 May 2002

RID="*"

ID="*"Corresponding author. Fax: +1-919/515-7331, E-mail: harald_ade@ncsu.edu

RID="**"

ID="**"Present address: Southern Illinois University, Physics, Mailcode 4401, Carbondale, IL 62901, USA

Rights and permissions

Reprints and permissions

About this article

Cite this article

Appel, G., Ade, H., Guerek, A. et al. Orientation studies of Si-phthalocyanine sulfonic acids cast on SiOx substrates . Appl Phys A 76, 177–182 (2003). https://doi.org/10.1007/s003390201320

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1007/s003390201320

Navigation