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Chemical, morphological and accumulation phenomena in ultrashort-pulse laser ablation of TiN in air

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Abstract.

Ultrashort-pulse laser ablation (τ=130 fs, λ=800 nm, repetition rate 2–20 Hz) of titanium nitride was investigated for laser fluences between 0.3 and 4.5 J/cm2 using the direct focusing technique in air. The influence of the laser pulse number and the peak fluence was investigated by means of several surface analytical techniques (optical microscopy, dynamic friction atomic force microscopy, scanning Auger electron microscopy and small-spot electron spectroscopy for chemical analysis). The correlation of the results about optical, physical and chemical properties of the irradiated areas allows us to propose a simple oxidation model, which explains different observed phenomena associated with surface damage such as mound formation and crater widening and clarifies the incubation behavior reported earlier for this material.

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Authors and Affiliations

  1. Bundesanstalt für Materialforschung und -prüfung, Laboratorium für Dünnschichttechnologien, Unter den Eichen 87, 12205 Berlin, Germany, , , , , , DE

    J. Bonse & W. Kautek

  2. Bundesanstalt für Materialforschung und -prüfung, Laboratorium für Polymeroberflächen und -schichten, Unter den Eichen 87, 12205 Berlin, Germany, , , , , , DE

    H. Sturm

  3. Bundesanstalt für Materialforschung und -prüfung, Laboratorium für Mikrobereichs- und Oberflächenanalyse; Rasterelektronenmikroskopie, Unter den Eichen 87, 12205 Berlin, Germany, , , , , , DE

    D. Schmidt

Authors
  1. J. Bonse
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  2. H. Sturm
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  3. D. Schmidt
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  4. W. Kautek
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Received: 8 May 2000 / Accepted: 9 May 2000 / Published online: 13 September 2000

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Bonse, J., Sturm, H., Schmidt, D. et al. Chemical, morphological and accumulation phenomena in ultrashort-pulse laser ablation of TiN in air . Appl Phys A 71, 657–665 (2000). https://doi.org/10.1007/s003390000585

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  • DOI: https://doi.org/10.1007/s003390000585

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