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Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering

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Abstract

Nb thin films were deposited onto Si wafers by direct current (DC) magnetron sputtering at different deposition pressures. The microstructure and nanomechanical properties of Nb films were investigated by scanning electron microscope, X-ray diffractometer, transmission electron microscope, atomic force microscope and nanoindenter. The results revealed that the grain size, thickness, surface roughness, the reduced elastic modulus (Er) and hardness (H) values of Nb thin films increased at the pressure range of 0.61–0.68 Pa. Meanwhile, the porosity of Nb films decreased with the increase in deposition pressure. The lattice deformation of Nb thin films changed from negative to positive with the increase in deposition pressure. It is concluded that deposition pressure influences the microstructure and nanomechanical properties of Nb films.

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Acknowledgments

This work was supported by the National Key Technology R&D Program with No. 2011BAK15B07.

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Authors and Affiliations

  1. Division of Nano Metrology and Materials Measurement, National Institute of Metrology, Beijing, 100029, China

    X. Li, X. F. Tao & L. L. Ren

  2. Division of Electricity and Magnetism, National Institute of Metrology, Beijing, 100029, China

    W. H. Cao

  3. School of Materials Science and Engineering, Central South University, Changsha, 410083, China

    L. Q. Zhou & G. F. Xu

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  1. X. Li
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Correspondence to X. Li.

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Li, X., Cao, W.H., Tao, X.F. et al. Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering. Appl. Phys. A 122, 505 (2016). https://doi.org/10.1007/s00339-016-9990-1

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  • DOI: https://doi.org/10.1007/s00339-016-9990-1

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