Abstract
This chapter attempts to give an overview of the historical development and current progress of femtosecond laser micro-nanofabrication based on multiphoton absorption, and particular emphasis is placed on two-photon photopolymerization. Femtosecond laser interaction with matter differs essentially from those with longer pulses or CW lasers in its significant nonlinearity, ultrafast characteristics and the possibility of highly localization of reaction volume. These features enable three-dimensional (3D) micro-nanofabrication in solid and liquid media. In two-photon photopolymerization, when a near-infrared femtosecond laser is tightly focused into a photopolymerizable resin, 3D polymer micro-nanostructures are produced by pinpoint photopolymerization of liquid precursory resins. Using this direct laser writing scheme, various photonic, micro-optical components and micromechanical devices have been readily produced. The two-photon photopolymerization technology is expected to play a similar role to that played by lithography for planar semiconductor device processing, but for micro-nanofabrication of 3D polymer-based optoelectronic devices as well for microelectromechanical systems.
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Abbreviations
- 2D:
-
Two-dimensional
- 3D:
-
Three-dimensional
- AFM:
-
Atomic force microscope
- B1536:
-
1,2-Dicyano-1,2-bis(2,4,5-trimethyl-3-thienyl)ethane
- BCC:
-
Body-centered cubic
- BSA:
-
Bovin serum albumin
- CAM:
-
Computer-aided manufacturing
- CAD:
-
Computer-aided design
- CCD:
-
Charge coupled device
- CW:
-
Continuous wave
- DBR:
-
Distributed Bragg reflection
- DFB:
-
Distributed feedback
- DMF:
-
Dimethyl formamide
- FCC:
-
Face-centered cubic
- FWHM:
-
Full width at half maximum
- HCP:
-
Hexagonal close packing
- IR:
-
Infrared
- LD:
-
Laser diode
- LED:
-
Light emitting diode
- ?CP:
-
Microcontact printing
- MEMS:
-
Microelectromechanical system
- MMA:
-
Methyl methacrylate
- MW:
-
Molecular weight
- NA:
-
Mumerical aperture
- NIR:
-
Near-infrared
- NSOM:
-
Near-field scanning optical microscope
- PAG:
-
Photoacid generator
- PBG:
-
Photonic bandgap
- PDMS:
-
Poly(dimethyl siloxane)
- PhC:
-
Photonic crystal
- PMMA:
-
Poly(methyl methacrylate)
- PSF:
-
Point spread function
- PVK:
-
Poly(vinyl carbazole)
- PZT:
-
Lead zirconate titanate
- R:
-
Radical
- RB:
-
Rose Bengal
- S:
-
Photosensitizer
- SC:
-
Simple cubic
- SDL:
-
Sub-diffraction-limited
- SEM:
-
Scanning electron microscope
- SLI:
-
Square of light intensity
- SLM:
-
Spatial light modulator
- STM:
-
Scanning tunneling microscope
- TE:
-
Transverse electric
- THPMA:
-
Tetrahydropyranyl methacrylate
- TM:
-
Transverse magnetic
- TPA:
-
Two-photon absorption
- TPE:
-
Two-photon excitation
- UV:
-
Ultraviolet
- Voxel:
-
Volume element
- XUV:
-
Extreme UV
- n :
-
Refractive index
- ? :
-
Two-photon absorption cross-section
- ? :
-
Electrical permittivity
- T g :
-
Glass transition temperature
- E :
-
Electric field strength; Young’s modulus
- I :
-
Light intensity
- ? :
-
Wavelength
- ? :
-
Lightwave frequency
- l c,:
-
Coherence length
- Q :
-
Quality factor
- ? 0,:
-
Beam waist of Gaussian beam
- Z R :
-
Rayleigh depth
- ? H+ :
-
Quantum efficiency of proton generation
- G s :
-
Shear modulus
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Sun, HB., Kawata, S. (2004). Two-Photon Photopolymerization and 3D Lithographic Microfabrication. In: NMR • 3D Analysis • Photopolymerization. Apvances in Polymer Science, vol 170. Springer, Berlin, Heidelberg. https://doi.org/10.1007/b94405
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