Abstract
Surface roughness (Rq) of dielectric materials plays an important role in the ordering and charge-carrier transport of organic semiconductors, and is directly involved in the development of nuclei and crystal grains on a surface. To investigate the effect of Rq-controlled dielectrics with similar surface energy (γ) on the development of nuclei and crystal grain, a series of triethoxysilane-terminated polystyrene (PSTES) polymers with different molecular weights (MW) values is synthesized using reversible addition-fragmentation chain transfer polymerization. The different MW PS-TES films are spun-cast on a hydroxyl (-OH)-rich SiO2 dielectric surface, and chemically coupled with -OH moieties at 110 °C. Some films are also rinsed with an excess of toluene to remove unreacted polymer residue, increasing the average Rq values of the treated SiO2 surfaces. The resulting polymer-treated dielectrics show similar surface energy values of 41.6-42.5 mJ m-2 but different Rq values ranging from 0.29 to 1.07 nm. On the nanoscale roughness-controlled dielectric surfaces, 40-nm-thick pentacene films show discernible types of crystal grains with different phases, shapes, sizes, and ordering, all of which significantly affect charge-carrier transport along π-conjugated semiconductors in organic field-effect transistors (OFETs). Pentacene OFETs show large variations in field-effect mobility (μFET) from 0.89 to 0.19 cm2 V-1 s-1. Specifically, at Rq=0.40 nm the μFET value suddenly decreases to 0.30 cm2 V-1 s-1. On polymer treated SiO2 dielectrics with an Rq value greater than 0.40 nm, polymorphic, less-ordered, and smaller grains of pentacene containing large number of charge trap sites developed, resulting in significantly degraded charge-carrier transport along the intra- and inter-grains in OFETs, in comparison to the well-ordered grains on smooth polymer-treated surfaces (Rq<0.40 nm).
Similar content being viewed by others
References
J. Zaumseil and H. Sirringhaus, Chem. Rev., 107, 1296 (2007).
J. Aimi, P.-H. Wang, C.-C. Shih, C.-F. Huang, T. Nakanishi, M. Takeuchi, H.-Y. Hsueh, and W.-C. Chen, J. Mater. Chem. C, 6, 2724 (2018).
L. Qiu, J. A. Lim, X. Wang, W. H. Lee, M. Hwang, and K. Cho, Adv. Mater., 20, 1141 (2008).
L. Torsi, G. M. Farinola, F. Marinelli, M. C. Tanese, O. H. Omar, L. Valli, F. Babudri, F. Palmisano, P. G. Zambonin and F. Naso, Nat. Mater., 7, 412 (2008).
C. D. Dimitrakopoulos and P. R. L. Malenfant, Adv. Mater., 14, 99 (2002).
J. E. Anthony, Chem. Rev., 106, 5028 (2006).
J. E. Anthony, Angew. Chem. Int. Ed., 47, 452 (2008)
M. Kitamura and Y. Arakawa, J. Phys., Condens. Matter, 20, 184011 (2008).
P. Lang, D. Mottaghi, and P.-C Lacaze, Appl. Surf. Sci., 365, 364 (2016).
H. Zhang, X. Guo, J. Hui, S. Hu and D. Zhu, Nano Lett., 11, 4939 (2011).
L. Viani, C, Risko, M. F. Toney, D. W. Breiby, and J.-L Brédas, ACS Nano, 8, 690 (2014).
R. P. Ortiz, A. Facchetti, and T. J. Marks, Chem. Rev., 110, 205 (2010).
O. Acton, G. G. Ting, P. J. Shamberger, F. S. Ohuchi, H. Ma, and A. K.-Y. Jen, ACS Appl. Mater. Interfaces, 2, 511 (2010).
S. H. Kim, M. Jang, H. Yang, J. E. Anthony, and C. E. Park, Adv. Funct. Mater., 21, 2198 (2011).
S. Lee, M. Jang, and H. Yang, ACS Appl. Mater. Interfaces, 6, 20444 (2014).
M. Jang, Y. C. Yu, H. Jeon, J. H. Youk, and H. Yang, ACS Appl. Mater. Interfaces, 7, 5274 (2015).
D. O. Hutchins, T. Weidner, J. Baio, B. Polishak, O. Acton, N. Cernetic, H. Ma, and A. K.-Y Jen, J. Mater. Chem. C, 1, 101 (2013).
W. Kang, G. An, M. J. Kim, W. H. Lee, D. Y. Lee, H. Kim, and J. H. Cho, J. Phys. Chem. C, 120, 3501 (2016).
M. Jang, M. Lee, H. Shin, J. Ahn, M. Pei, J. H. Youk, and H. Yang, Adv. Mater. Interfaces, 201670068 (2016).
K. Kim, S. G. Hahm, Y. Kim, S. Kim, S. H. Kim, and C. E. Park, Org. Electron., 21, 111 (2015).
M. Pei, A. S. Lee, S. S. Hwang, and H. Yang, J. Mater. Chem. C, 5, 10955 (2017).
S. E. Fritz, T. W. Kelley, and C. D. Frisbie, J. Phys. Chem. B, 109, 10574 (2005).
H.-W. Zan and C.-W. Chou, Jpn. J. Appl. Phys., 48, 031501 (2009).
K. Shin, C. Yang, S. Y. Yang, H. Jeon, and C. E. Park, Appl. Phys. Lett., 88, 072109 (2006).
H.-G. Min, E. Seo, J. Lee, N. Park and H. S. Lee, Synth. Met., 163, 7 (2013).
G. Lin, Q. Wang, L. Peng, M. Wang, H. Lu, G. Zhang, G. Lv, and L. Qiu, J. Phys. D: Appl. Phys., 48, 105103 (2015).
D. Yang, L. Zhang, S. Y. Yang, and B. S. Zou, IEEE Photonics J., 5, 6801709 (2013).
R. Ruiz, D. Choudhary, B. Nickel, T. Toccoli, K.-C. Chang, A. C. Mayer, P. Clancy, J. M. Blakely, R. L. Headrick, S. Iannotta, and G. G. Malliaras, Chem. Mater., 16, 4497 (2004).
M. Sthtein, J. Mapel, J. B. Benziger, and S. R. Forrest, Appl. Phys. Lett., 81, 268 (2002).
E. M. Muller and J. A. Marohn, Adv. Mater., 17, 1410 (2005).
H. Yang, T. J. Shin, M.-M. Ling, K. Cho, C. Y. Ryu, and Z. Bao, J. Am. Chem. Soc., 127, 11542 (2005).
S. H. Park, H. S. Lee, J.-D. Kim, D. W. Breiby, E. Kim, Y. D. Park, D. Y. Ryu, D. R. Lee, and J. H. Cho, J. Mater. Chem., 21, 15580 (2011).
M. Jang, J. H. Park, S. Im, S. H. Kim, and H. Yang, Adv. Mater., 26, 288 (2014).
Y. K. Chong, G. Moad, E. Rizzardo, and S. H. Thang, Macromolecules, 40, 4446 (2007).
H. Yang, S. H. Kim, L. Yang, S. Y. Yang, and C. E. Park, Adv. Mater., 19, 2868 (2007).
M. Pei, J. Huang, M. Jang, J.-H. Kim, M. Lee, J. Chen, D. H. Hwang, and H. Yang, J. Phys. Chem. C, 120, 903 (2016).
W. H. Lee, H. H. Choi, D. H. Kim, and K. Cho, Adv. Mater., 26, 1660 (2014).
Author information
Authors and Affiliations
Corresponding authors
Additional information
Acknowledgment: This work was supported by an Inha University Research Grant.
Electronic supplementary material
Rights and permissions
About this article
Cite this article
Pei, M., Ko, J.S., Shin, H. et al. Self-Assembly of Pentacene on Sub-nm Scale Surface Roughness-Controlled Gate Dielectrics. Macromol. Res. 26, 942–949 (2018). https://doi.org/10.1007/s13233-018-6129-6
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s13233-018-6129-6