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Simultaneous measurement of the piezoelectric and dielectric response of nanoscale ferroelectric capacitors by an atomic force microscopy based approach

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Abstract

We present a sensitive method to simultaneously acquire the C(V ) characteristics and piezoresponse of sub-micron size ferroelectric capacitors using an Atomic Force Microscope (AFM). Model Pt/(La0.5,Sr0.5)CoO3/PbZr0.4Ti0.6 O3/(La0.5,Sr0.5)CoO3/La:SrTiO3/Si nanocapacitors were fabricated by focused ion beam milling from 100 μm2 down to 0.04 μm2. With this AFM based capacitance measurement technique we show clear “double-humped” C(V ) for all sizes with no significant change in the peak value of the εr down to capacitors with the smallest area of 0.04 μm2. The smallest capacitance measured is only of the order a few femtofarads, demonstrating the high sensitivity of the technique. Simultaneously, the piezoelectric response is recorded for each measurement, thus the technique facilitates simultaneous piezoresponse and dielectric characterization of ferroelectric memory devices.

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Authors and Affiliations

  1. Institut für Festkoerperforschung and CNI, Forschungszentrum Jülich GmbH, Jülich, Germany

    A. Petraru, H. Kohlstedt & R. Waser

  2. School of Materials Science and Engineering, University of New South Wales, Sydney, NSW, 2052, Australia

    V. Nagarajan

  3. Department of Materials Science and Engineering and Department of Physics, University of California, Berkeley, CA, 94720, USA

    H. Kohlstedt & R. Ramesh

  4. Department of Materials Science and Engineering Pennsylvania State University, University Park, Park, PA, 16802, USA

    D.G. Schlom

Authors
  1. A. Petraru
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  2. V. Nagarajan
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  3. H. Kohlstedt
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  4. R. Ramesh
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  5. D.G. Schlom
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  6. R. Waser
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Corresponding author

Correspondence to A. Petraru.

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PACS

77.55.+f; 77.90.+k; 85.50.-n; 77.84.-s

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Petraru, A., Nagarajan, V., Kohlstedt, H. et al. Simultaneous measurement of the piezoelectric and dielectric response of nanoscale ferroelectric capacitors by an atomic force microscopy based approach. Appl. Phys. A 84, 67–71 (2006). https://doi.org/10.1007/s00339-006-3592-2

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  • DOI: https://doi.org/10.1007/s00339-006-3592-2

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