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Three-dimensional depth profiling of molecular structures

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Abstract

Molecular time of flight secondary ion mass spectrometry (ToF-SIMS) imaging and cluster ion beam erosion are combined to perform a three-dimensional chemical analysis of molecular films. The resulting dataset allows a number of artifacts inherent in sputter depth profiling to be assessed. These artifacts arise from lateral inhomogeneities of either the erosion rate or the sample itself. Using a test structure based on a trehalose film deposited on Si, we demonstrate that the “local” depth resolution may approach values which are close to the physical limit introduced by the information depth of the (static) ToF-SIMS method itself.

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Acknowledgements

Financial support from the National Institute of Health under grant # EB002016-15, the National Science Foundation under grant # CHE-0555314, and the Department of Energy grant # DE-FG02-06ER15803 are acknowledged.

Author information

Author notes

  1. J. Cheng

    Present address: Merck & Co., Inc., WP78-210, 770 Sumneytown Pike, West Point, PA, 19486, USA

  2. L. Zheng

    Present address: Evans Analytical Group, 810 Kifer Rd., Sunnyvale, CA, 94086, USA

Authors and Affiliations

  1. Fachbereich Physik, Universität Duisburg-Essen, 47048, Duisburg, Germany

    A. Wucher

  2. Department of Chemistry, Pennsylvania State University, 104 Chemistry Bldg., University Park, PA, 16802, USA

    J. Cheng, L. Zheng & N. Winograd

Authors
  1. A. Wucher
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  2. J. Cheng
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  3. L. Zheng
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  4. N. Winograd
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Corresponding author

Correspondence to A. Wucher.

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Wucher, A., Cheng, J., Zheng, L. et al. Three-dimensional depth profiling of molecular structures. Anal Bioanal Chem 393, 1835–1842 (2009). https://doi.org/10.1007/s00216-008-2596-5

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  • DOI: https://doi.org/10.1007/s00216-008-2596-5

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