Reactive atomization of silicon to formin situ oxide sintering aids

Abstract

The present investigation demonstrated the feasibility of using reactive atomization to produce Si powder within situ oxide sintering aids. With further process optimization, this powder may be an alternative starting material to the conventional, mechanically blended, Si-plus-oxide powder used to produce commercial sintered reaction bonded silicon nitride (SRBSN). In the reactive atomization approach, yttrium and aluminum additives were introduced into silicon metal during induction melting. Reactive atomization was accomplished using a N₂-5 pct O₂ mixture as the atomization gas. During atomization, oxygen in the atomization gas reacted with Y and Al in the Si melt to produce Y₂O₃ and Al₂O₃, which act asin situ sintering aids. The reactive atomized powder demonstrated a Gaussian distribution with a mean diameter of 36 μm. The powder fines (<38 μm) were used to produce cold isostatically pressed compacts that were subsequently reaction bonded and sintered. The results demonstrate that β-Si₃N₄ formed during reaction bonding and sintering. The density of the SRBSN was 77 pct of theoretical. Transmission electron microscopy (TEM) studies indicated the presence of a glassy phase on the grain boundaries, which is typical in SRBSN and indicative of the presence of thein situ sintering aids. A kinetic model was used to study the influence of processing parameters, such as droplet temperature and oxygen partial pressure, on the kinetics of oxide formation during reactive atomization. The results suggest that the volume fraction of oxides increases with increasing droplet temperature and oxygen partial pressure in the atomization gas mixture.