Abstract
ArF laser-induced CVD has been employed to generate hydrogenated amorphous silicon (a-Si:H) from Si2H6 gas dilute with He, Ar, or H2. The formation of amorphous films or powder is found to depend critically on the kind of buffer gas, the stationary total and partial gas pressures, and the substrate temperature. These dependences have been investigated in the 1–5 Torr pressure and 100–400 °C temperature ranges. They are semiquantitatively discussed in terms of ArF laser photolysis of disilane, gas heating by heat flow from the substrate and laser irradiation, diffusion, and gas phase polymerization. Furthermore, photo ionization has been observed but found irrelevant for the a-Si:H layer properties. The photo and dark conductivities (σ ph,σ d) of the semiconductor layers are determined by the substrate temperature. Theσ ph values range between 10−7 and 10−4 Ω−1 cm−1 and theσ d values between 10−11 and 10−8 Ω−1 cm−1. The maximum ratioσ ph/σ d amounts to 4×104. The layers are further characterized by their optical band gap and activation energy. The layer properties are compared to literature values of amorphous films prepared by various photo, HOMO, and plasma CVD methods.
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References
H. Fritzsche: Physics Today10, 34 (Oct. 1984)
J.D. Joannopoulos, G. Lucovsky (eds.):The Physics of Hydrogenated Amorphous Silicon, I and II, Topics Appl. Phys.55, 56 (Springer, Berlin, Heidelberg 1984)
J.I. Pankove (ed.):Semiconductor and Semimetals, 21 A-D (Academic, Orlando 1984)
K. Takahashi, M. Konagai:Amorphous Silicon Solar Cells (Academic, Oxford 1986)
E. Bucher: Phys. Techn.17, 152 (1986)
M. Konagai: Mat. Res. Soc. Symp. Proc.70, 257 (1986)
C.R. Wronski: Solid State Techn. June 1988, p. 113
M. Hanabusa: Mat. Sci. Rep.2, 51 (1987)
K. Tanaka, A. Matsuda: Mat. Sci. Rep.2, 139 (1987)
D. Bäuerle:Chemical Processing with Lasers, Springer Ser. Mat. Sci.1 (Springer, Berlin, Heidelberg 1986)
I. Gianinoni, M. Musci: Nucl. Instr. Meth. Phys. Res. A239, 406 (1985)
R. Bilenchi, I. Gianinoni, M. Musci, R. Murri, S. Tacchetti: Appl. Phys. Lett.47, 279 (1985)
M. Meunier, J.H. Flint, J.S. Haggerty, D. Adler: J. Appl. Phys.62, 2812 (1987)
M. Meunier, J.H. Flint, J.S. Haggerty, D. Adler: J. Appl. Phys.62, 2822 (1987)
D. Metzger, K. Hesch, P. Hess: Appl. Phys. A45, 345 (1988)
T. Inoue, M. Konagai, K. Takahashi: Appl. Phys. Lett.43, 774 (1983)
Y. Tarui, K. Sorimachi, K. Fujii, K. Aota: J. Non-Cryst. Solids59, 60, 711 (1983)
T. Saitoh, S. Muramatsu, T. Shimada, M. Migitaka: Appl. Phys. Lett.42, 678 (1983)
T. Tanaka, W.Y. Kim, M. Konagai, K. Takahashi: Appl. Phys. Lett.45, 865 (1984)
H. Takei, T. Tanaka, W.Y. Kim, M. Konagai, K. Takahashi: J. Appl. Phys.58, 3664 (1985)
A.E. Delahoy, B. Doele, F.B. Ellis Jr., K.R. Ramaprasad, T. Tonon, J. Van Dine: Mat. Res. Soc. Symp. Proc.49, 33 (1985)
N. Mutsukura, Y. Katoh, Y. Machi: J. Appl. Phys.60, 3364 (1986)
N. Mutsukura, Y. Machi: Appl. Phys. B41, 103 (1986)
R.E. Rocheleau, S.C. Jackson, S.S. Hegedus, B.N. Baron: Mat. Res. Soc. Symp. Proc.70, 37 (1986)
A.E. Delahoy: Sol. Cells21, 153 (1987)
R.E. Rocheleau, S.S. Hegedus, W.A. Buchanan, S.C. Jackson: Appl. Phys. Lett.51, 133 (1987)
Y. Mishima, Y. Ashida, M. Hirose: J. Non-Cryst. Solids59, 60, 707 (1983)
A. Yoshikawa, S. Yamaga: Jpn. J. Appl. Phys.23, L91 (1984)
M. Hirose: Proc. of SERI/DOE Annual Review Meeting (Washington, DC 1985) p. 26
A. Yamada, M. Konagai, K. Takahashi: Jpn. J. Appl. Phys.24, 1586 (1985)
S. Nakano, Y. Kuwano, M. Ohnishi: Appl. Phys. A41, 267 (1986)
Review paper presented at the symposium in Hsinsua, Taiwan (August 1986) by W.I. Milne, P.A. Robertson, Cambridge University, Engineering Department, Trumpington Street, Cambridge CB2 1PZ, England
P.A. Robertson, W.I. Milne: Mat. Res. Soc. Symp. Proc.70, 31 (1986)
K. Kumata, U. Itoh, Y. Toyoshima, N. Tanaka, H. Anzai, A. Matsuda: Appl. Phys. Lett.48, 1380 (1986)
T. Taguchi, M. Morikawa, Y. Hiratsuka, K. Toyoda: Appl. Phys. Lett.49, 971 (1986)
H. Zarnani, H. Demiryont, G.J. Collins: J. Appl. Phys.60, 2523 (1986)
Y. Toyoshima, K. Kumata, U. Itoh, H. Matsuda: Appl. Phys. Lett.51, 1925 (1987)
H. Bock, W. Ensslin, F. Feher, R. Freund: J. Am. Chem. Soc.98, 668 (1976); value estimated from Fig. 2 in this reference
Cf. preliminary results: F.J. Comes, T.R. Dietrich, S. Chiussi: “Dünnschicht-Solarzellen aus amorphem Silizium: Photo-CVD” in “Statusreport 1987, Photovoltaik”, Bundeministerium für Forschung und Technologie (1987) p. 143
U. Itoh, Y. Toyoshima, H. Onuki, N. Washida, T. Ibuki: J. Chem. Phys.85, 4867 (1986)
H. Stafast: Appl. Phys. A45, 93 (1988)
J.O. Chu, D.B. Beach, J.M. Jasinski: J. Phys. Chem.91, 5340 (1987)
W.J. Moore, D.O. Hummel:Physikalische Chemie, 2nd ed. (Gruyter, Berlin 1976), pp. 683, 705
W.D. Allen, H.F. Schaefer III: Chem. Phys.108, 243 (1986)
K.F. Roenigk, K.F. Jensen, R.W. Carr: J. Phys. Chem.91, 5732 (1987); and92, 4254 (1988)
J.M. Jasinski, J.O. Chu: J. Chem. Phys.88, 1678 (1988)
E.M. Tebben, M.A. Ring: Inorg. Chem.8, 1787 (1969)
G.G.A. Perkins, F.W. Lampe: J. Am. Chem. Soc.102, 3764 (1980)
M.A. Dillon, D. Spence, L. Boesten, H. Tanaka: J. Chem. Phys.88, 4320 (1988)
A. Roth: Part of diploma thesis, University of Frankfurt (1988)
B.A. Scott: In [Ref. 3, Vol. 21A, p. 123]
J. Perrin: Les Editions de Physique, Vol. XVII (Paris 1987) p. 105
J.M. Jasinski, B.S. Meyerson, B.A. Scott: Ann. Rev. Phys. Chem.38, 109 (1987)
M.J. Kushner: J. Appl. Phys.63, 2532 (1988)
A. Gallagher: J. Appl. Phys.63, 2406 (1988)
H. Takasaki, W.Y. Kim, M. Hallerdt, M. Konagai, K. Takahashi: J. Appl. Phys.63, 550 (1988)
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Dietrich, T.R., Chiussi, S., Stafast, H. et al. ArF laser CVD of hydrogenated amorphous silicon: The role of buffer gases. Appl. Phys. A 48, 405–414 (1989). https://doi.org/10.1007/BF00619710
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DOI: https://doi.org/10.1007/BF00619710