Skip to main content
SpringerLink
Log in
SpringerLink
Log in

Electron Beam Lithography (EBL)

  • Reference work entry
Encyclopedia of Nanotechnology

Synonyms

e-beam lithography, EBL

Definition

Electron beam lithography (often abbreviated as e-beam lithography or EBL) is the process of transferring a pattern onto the surface of a substrate by first scanning a thin layer of organic film (called resist) on the surface by a tightly focused and precisely controlled electron beam (exposure) and then selectively removing the exposed or nonexposed regions of the resist in a solvent (developing). The process allows patterning of very small features, often with the dimensions of submicrometer down to a few nanometers, either covering the selected areas of the surface by the resist or exposing otherwise resist-covered areas. The exposed areas could be further processed for etching or thin-film deposition while the covered parts are protected during these processes. The advantage of e-beam lithography stems from the shorter wavelength of accelerated electrons compared to the wavelength of ultraviolet (UV) light used in photolithography, which...

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Log in via an institution
Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 1,299.99
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

References

  1. Rius Sune, G: Electron lithography for nanofabrication. Ph.D. dissertation, Universitat Autonoma de Barcelona (2008)

    Google Scholar 

  2. Herriott, D.R., Brewer, G.R.: Electron-beam lithography machines, chapter 3. In: Brewer, G.R. (ed.) Electron-Beam Technology in Microelectronic Fabrication, pp. 141–216. Academic, New York (1980)

    Google Scholar 

  3. Tseng, A.A., Chen, K., Chen, C.D., Ma, K.J.: Electron beam lithography in nanoscale fabrication: recent development. IEEE Trans. Electron. Packag. Manuf. 26(2), 141–149 (2003)

    Article  CAS  Google Scholar 

  4. Goldstein, J., Newbmy, D., Joy, D., Lyman, C., Echlin, P., Lifshin, E., Sawyer, L., Michael, J.: Scanning Electron Microscopy and X-ray Microanalysis, 3rd edn. Springer, New York (2003). ISBN 0 306 47292 47299

    Book  Google Scholar 

  5. Rai-Choudhury, P.: Handbook of Microlithography, Micromachining and Microfabrication, volume 1: Microlithography. SPIE Press Monograph, vol. PM39. SPIE Press, Bellingham (1997)

    Google Scholar 

  6. Jones, G., Blythe, S., Ahmed, H.: Very high voltage (500 kV) electron beam lithography for thick resists and high resolution. J. Vac. Sci. Technol. B 5(1), 120–123 (1987)

    Article  CAS  Google Scholar 

  7. Lee, S., Cook, B.: PYRAMID – a hierarchical, rule-based approach toward proximity effect correction – part II: correction. IEEE Trans. Semiconduct. Manuf. 11(1), 117–128 (1998)

    Article  Google Scholar 

  8. Tennant, D.M., Bleir, A.R.: Electron beam lithography of nanostructures. In: Wiederrecht, G. (ed.) Handbook of Nanofabrication. Elsevier, Amsterdam (2009)

    Google Scholar 

  9. Harriott, L.R.: Scattering with angular limitation projection electron beam lithography for suboptical lithography. J. Vac. Sci. Technol. B 15(6), 2130–2135 (1997)

    Article  CAS  Google Scholar 

  10. Chang, T.H.P., Kern, D.P.: Arrayed miniature electron beam columns for high throughput sub-100 nm lithography. J. Vac. Sci. Technol. 10(6), 2743–2748 (1992)

    Article  CAS  Google Scholar 

  11. Shimazu, N., Saito, K., Fujinami, M.: An approach to a high-throughput e-beam writer with a single-gun muliple-path system. Jpn. J. Appl. Phys. 35(12B), 6689–6695 (1995)

    Article  Google Scholar 

  12. Petric, P., Bevis, C., Carroll, A., Percy, H., Zywno, M., Standiford, K., Brodie, A., Bareket, N., Grella, L.: REBL: A novel approach to high speed maskless electron beam direct write lithography. J. Vac. Sci. Technol. B27(1), 161 (2009)

    Google Scholar 

  13. Photo by D. Carr and H. Craighead, Cornell Press Release, July 1997.

    Google Scholar 

  14. Sekaric, L.: The high and low notes of the Universe, Physics News Update, Number 659 (2003)

    Google Scholar 

  15. Ilic, B., Craighead, H.G., Krylov, S., Senaratne, W., Ober, C., Neuzil, P.: Attogram detection using nanoelectro-mechanical oscillators. J. Appl. Phys. 95, 3694 (2004)

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Department of Electrical and Computer Engineering, Florida International University, 10555 W. Flagler Street, EC 3914, Miami, FL, 33174, USA

    Prof. Nezih Pala & Mustafa Karabiyik

Authors
  1. Prof. Nezih Pala
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Mustafa Karabiyik
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Nezih Pala .

Editor information

Editors and Affiliations

  1. Ohio Eminent Scholar and The Howard D. Winbigler Professor, Director, Nanoprobe Laboratory for Bio- & Nanotechnology and Biomimetics (NLB2), Ohio State University, 201 W. 19th Avenue, Columbus, Ohio, 43210-1142, USA

    Bharat Bhushan

Rights and permissions

Reprints and permissions

Copyright information

© 2012 Springer Science+Business Media B.V.

About this entry

Cite this entry

Pala, N., Karabiyik, M. (2012). Electron Beam Lithography (EBL). In: Bhushan, B. (eds) Encyclopedia of Nanotechnology. Springer, Dordrecht. https://doi.org/10.1007/978-90-481-9751-4_344

Download citation

Publish with us

Policies and ethics

Search

Navigation