Abstract
The effect of incorporating pairs of dopant atoms of opposite polarities into the nanowire lattice on the electrical behavior of nanowires has been presented in this paper. The dopants used are boron and phosphorus atoms. Intrinsic silicon nanowire is incapacitated with boron-phosphorus dopant atom pairs in a progressive manner, starting from one pair to nine dopant-atom pairs. The nanowire is simulated each time an additional dopant pair is introduced in the nanowire lattice to obtain current-voltage characteristics. These characteristics have been compared with that obtained by introducing similar dopants in an intrinsic germanium nanowire lattice. The power efficiencies of both intrinsic and doped silicon and germanium nanowires have been discussed towards the end of the paper.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
J. Wang, Device physics and simulation of silicon NW transistors. PhD Thesis, Univ. Purdue, August 2005
E. Sangiorgi, A. Asenov, H.S. Bennett, R.W. Dutton, D. Esseni, M.D. Giles, M. Hane, C. Jungemann, K. Nishi, S. Selberherr, S. Takagi, Special issue on simulation and modeling of nanoelectronics devices. IEEE Trans. Electron Devices 54(9), 2072–2078
Wang, Theoretical investigation of surface roughness scattering in silicon nanowire transistors. Appl. Phys. Lett. 87, 043101 (2005)
C. Enz, E.A. Vittoz, Charge-based MOS transistor modeling. The EKV model for low power and RF IC design. Wiley (2006)
A.K. Sharma, S.H. Zaidi, S. Lucero, S.R.J. Brueck, N.E. Islam, Mobility and transverse electric field effects in channel conduction of wrap-around-gate NW MOSFETs. In: IEE Proceedings-Circuits Devices System, vol. 151, no. 5, pp. 422–430, October 2004
A. Chaudhry, J.N. Roy, MOSFET models, quantum mechanical effects and modeling approaches: a review. Semiconductor Technol. Sci. 10(1), 20–27 (2010)
Y.S. Yu1, N. Cho, J.H. Oh, S.W. Hwang, D. Ahn, Explicit continuous current–voltage (I–V) models for fully-depleted surrounding-gate MOSFETs (SGMOSFETs) with a finite doping body. J. Nanosci. Nanotechnol. 10(5), 3316–3320 (2010)
C.A. Richter, H.D. Xiong, X. Zhu, W. Wang, V.M. Stanford, W.-Ki Hong, T. Lee, D.E. Ioannou, Q. Li, Metrology for the electrical characterization of semiconductor NWs. IEEE Trans. Electron Devices 55(11), 3086–3095 (2008)
B. Iñiguez, T.A. Fjeldly, A. Lázaro, F. Danneville, M.J. Deen, Compact-modeling solutions for nanoscale double-gate and gate-all-around MOSFETs. IEEE Trans. Electron Devices 53(9), 2128–2142 (2006)
C. Mayank, G. Kinshuk, V.G. Babu et al., A technological review on quantum ballistic transport model based silicon nanowire field effect transistors for circuit simulation and design. J. Nanosci. Nanoeng. Appl. 5(2), 20–31p (2015)
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2016 Springer India
About this paper
Cite this paper
Chakraverty, M., Harisankar, P.S., Gupta, K., Ruparelia, V., Rahman, H. (2016). Simulation of Electrical Characteristics of Silicon and Germanium Nanowires Progressively Doped to Zener Diode Configuration Using First Principle Calculations. In: Satapathy, S., Rao, N., Kumar, S., Raj, C., Rao, V., Sarma, G. (eds) Microelectronics, Electromagnetics and Telecommunications. Lecture Notes in Electrical Engineering, vol 372. Springer, New Delhi. https://doi.org/10.1007/978-81-322-2728-1_38
Download citation
DOI: https://doi.org/10.1007/978-81-322-2728-1_38
Published:
Publisher Name: Springer, New Delhi
Print ISBN: 978-81-322-2726-7
Online ISBN: 978-81-322-2728-1
eBook Packages: EngineeringEngineering (R0)