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Error Arising from Original Approximation in Photothermal Measurement of Weak Absorption of Optical Thin Film

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Review of Progress in Quantitative Nondestructive Evaluation

Part of the book series: Advances in Cryogenic Engineering ((RPQN,volume 28))

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Abstract

The technique of photothermal deflection spectroscopy (PTDS) for absorption measurement of optical thin film is simple in installation and fast in detection. However, while measurable absorbance reaches the order of magnitude of 10-7, e.g. in studies of optical thin film and investigation of laser damage mechanisms [1,2], we are still doubtful of its precision because of the lack of independent evaluation with available instruments whose precision could reach this lower limit. This work aims at giving a theoretical investigation on the source of error in order to obtain a realistic estimate of measurement error and hence to find optimal way to minimize measurement error in applying PTDS to optical thin film.

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References

  1. A. C. Boccare and D. Fournier, Opt. Lett. 5 377 (1980)

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  2. Shi Baixuan, Hu Kai and Chen Wenbin, Proceedings of 5th Int. Topical Meeting Photoacoustic and Photothermal Phenomena’ (Springer Series in Optical Science 58 207 (1987)

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  3. Wu Kai, MSc Thesis ‘The Research on Weak Absorbance Measurement of Optical Thin Film by PA and PTDS’, Zhejiang University (1987)

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  4. L. W. Casperson, Appl. Opt. 12 2434 (1973)

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  5. Chen Wenbin, Shi Baixuan and Huang Xuebo, Journal of Zhejiang University, 23 532 (1989)

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Author information

Authors and Affiliations

  1. Department of Optical Engineering, Zhejiang University, China

    Baixuan Shi & Wenbin Chen

  2. Department of Applied Science, City Polytechnic of Hong Kong, HK, China

    G. G. Siu

  3. Faculty Laboratory Centre, City Polytechnic of Hong Kong, HK, China

    D. S. Chiu

Authors
  1. Baixuan Shi
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  2. Wenbin Chen
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  3. G. G. Siu
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  4. D. S. Chiu
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Editor information

Editors and Affiliations

  1. Center for NDE Ames Laboratory (USDOE) and Department of Aerospace Engineering and Engineering Mechanics, Iowa State University, Ames, Iowa, USA

    Donald O. Thompson

  2. Center for NDE and Department of Materials Science and Engineering, The Johns Hopkins University, Baltimore, Maryland, USA

    Dale E. Chimenti

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© 1992 Springer Science+Business Media New York

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Shi, B., Chen, W., Siu, G.G., Chiu, D.S. (1992). Error Arising from Original Approximation in Photothermal Measurement of Weak Absorption of Optical Thin Film. In: Thompson, D.O., Chimenti, D.E. (eds) Review of Progress in Quantitative Nondestructive Evaluation. Advances in Cryogenic Engineering, vol 28. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3344-3_64

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  • DOI: https://doi.org/10.1007/978-1-4615-3344-3_64

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4613-6474-0

  • Online ISBN: 978-1-4615-3344-3

  • eBook Packages: Springer Book Archive

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